The CINaM is promoted by J. Vac. Sci. Techno. A’s Editors
N-sources are critical in plasma-ALD of TiN.
Their nature (NH3 or N2), their dilution, the plasma power as well as thermal treatments significantly modify the film properties and conductivity.
URL: https://avs.scitation.org/topic/collections/editors-pick?SeriesKey=jva
Title : Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments
Auteurs : Clémence Badie, Héloïse Tissot, Beniamino Sciacca, Maïssa K.Barr, Julien Bachmann, Christophe Vallée, Gaël Gautier, Thomas Defforge, Vincent Astié, Jean-Manuel Decams, Mikhael Bechelany, Lionel Santinacci*
Ref : J. Vac. Sci. Techno. A. 41 (3), 032401 (2023)