Lithography PLANETE Nanofab Lithography Deposition Etching Metrology Optical and electron beam lithography Metal lines (width < 20 nm) Metal nanodots Cr/Au (diameter < 50 nm) Alignment of two layers using e-beam lithography High resolution e-beam lithography + lift off process Pioneer e-beam lithography toolc(Raith) Field Emission Gun (FEG) 2nm 5x5 cm Laser Interferometer Stage Stitching and Alignement <20nm Autofocus system MJB4 Mask Aligner (Süss Microtec) UV Lithography Filtered light at 365nm Resolution 0.8µm Wafer sizes up to 4" (100mm) Realignment precision <1µm µMLA Maskless Lithography (Heidelberg Instruments) Maskless UV lithography 365nm light Resolution 1 µm Wafer size up to 100 mm Alignment precision 1 µm