Nanofabrication

Nanofabrication

Plasmonic structures, LP3 - CINaM collaboration

Gold nanostructure arrays obtained by e-beam lithography

Deposition of nano-objects

Tungsten nanowire array

Local Focused Ion Beam (FIBID) and Electron Beam Induced Deposition (EBID)

Tungsten nanodots deposition (EBID)

Configuration of nanofabrication tools

PIONEER System (RAITH GMBH)

  • Hot cathode field emission electron gun (FEG)
  • Electron column (100eV to 30 keV)
  • Maximum e-beam current >1nA
  • The focused beam size <2nm
  • Back-scattered and secondary electron detectors (in-lens and out-lens)
  • Interferometric stage 5cmx5cm (accuracy <20nm)
  • Tilt module 0 to 90°
  • GDSII Editor

Gas injection system (Orsay Physics)

6 injection lines

  • Platinum
  • Tungsten
  • Silicon oxide
  • Xenon fluoride (for etching)
  • Water vapor
  • Purging line

Scanning Electron Microscope (JEOL 5910) / FIB (Canion31+ OrsayPhysics)

  • Tungsten filament electron source
  • Electron column (500eV to 30 keV)
  • Focused beam size <20nm
  • Out-lens secondary electron detector
  • Tilt module 0 to 90°
  • GDSII editor

Focused Ion Beam column (Ga+)

Gas Injection System

5 injection lines

  • Platinum
  • Tungsten
  • Silicon oxide
  • Carbon

In situ electrical measurement system

The PIONEER station was obtained in 2012 within the framework of a European FEDER project with the support of South PACA Region, Conseil Général des Bouches du Rhône, Aix-Marseille University, C'Nano PACA.

Nanofabrication