Nanofabrication
Nanofabrication
Configuration of nanofabrication tools
PIONEER System (RAITH GMBH)
- Hot cathode field emission electron gun (FEG)
- Electron column (100eV to 30 keV)
- Maximum e-beam current >1nA
- The focused beam size <2nm
- Back-scattered and secondary electron detectors (in-lens and out-lens)
- Interferometric stage 5cmx5cm (accuracy <20nm)
- Tilt module 0 to 90°
- GDSII Editor
Gas injection system (Orsay Physics)
6 injection lines
- Platinum
- Tungsten
- Silicon oxide
- Xenon fluoride (for etching)
- Water vapor
- Purging line
Scanning Electron Microscope (JEOL 5910) / FIB (Canion31+ OrsayPhysics)
- Tungsten filament electron source
- Electron column (500eV to 30 keV)
- Focused beam size <20nm
- Out-lens secondary electron detector
- Tilt module 0 to 90°
- GDSII editor
Focused Ion Beam column (Ga+)
Gas Injection System
5 injection lines
- Platinum
- Tungsten
- Silicon oxide
- Carbon
In situ electrical measurement system
The PIONEER station was obtained in 2012 within the framework of a European FEDER project with the support of South PACA Region, Conseil Général des Bouches du Rhône, Aix-Marseille University, C'Nano PACA.