Chemical Alkaline Etching of Silicon Mie Particles

Collaboration between Institut Fresnel (Marseille), Institut des Nanosciences de Paris and CINaM (Planète) resulted in fabrication of silicon Mie resonators and caracterisation of their optical properties. Chemical etching via alkaline solutions is associated with electronic lithography to structure at a nanometer scale silicon Mie resonators. Two different alkaline solutions are employed and their influences on the shape of the resonators are discussed.

This method avoids the use of reactive ion etching and appears to be very well adapted to design silicon particles at a nanometer scale for applications in nanophotonics.

More information : « Chemical Alkaline Etching of Silicon Mie Particles » Julien Proust, Frédéric Bedu, Stéphane Chenot, Ibrahima Soumahoro, Igor Ozerov, Bruno Gallas, Redha Abdeddaim and Nicolas Bonod,

Advanced Optical Materials, 3, 1280-1286 (2015)

DOI : 10.1002/adom.201500146