Nanofabrication

• Hot cathode field emission electron gun (FEG)
• Electron column (100eV to 30 keV)
• Maximum e-beam current >1nA
• The focused beam size <2nm
• Back-scattered and secondary electron detectors (in-lens and out-lens)
• Interferometric stage 5cmx5cm (accuracy <20nm)
• Tilt module 0 to 90°
• GDSII Editor

Gas injection system (Orsay Physics)

6 injection lines

• Platinum
• Tungsten
• Silicon oxide
• Xenon fluoride (for etching)
• Water vapor
• Purging line

• Elstar electron column with UC+ technology

• Tomahawk HT Ga⁺ focused ion beam (FIB) column with Fast Beam Blanker

• 3 gas injection systems (Pt, W, C)

• EasyLift EX nanomanipulator

• Oxford Ultim Max 100 mm² EDS

• RAITH Elphy MultiBeam lithography system

The Helios 5 UC system was acquired and installed in 2025. It was co-funded by the French government and local authorities (Région Sud and Ville de Marseille) as part of the State-Region Planning Contract (CPER 2021–2027) and the Priority Research Equipment and Program (PEPR Electronique).

The PIONEER station was obtained in 2012 within the framework of a European FEDER project with the support of South PACA Region, Conseil Général des Bouches du Rhône, Aix-Marseille University, C'Nano PACA.